Weimin Gao, Professor

E-mail：gaoweimin@tsinghua.edu.cn

Weimin Gao obtained a Bachelor's degree in Optical Engineering from Zhejiang University in 1985. He received his M.S. and Ph.D. in Physics from the University of Leuven (KU Leuven), Belgium, in 1998 and 2001, respectively. He had held positions at the imec, and Synopsys. From 2018 to 2025, he served as Technical Director at ASML in China. In 2025, he joined the School of Integrated Circuits at Tsinghua University.

Dr. Gao is an expert in advanced optical lithography with over 20 years of extensive experience. He has participated in the patterning development of multiple generations of advanced CMOS technology from the 0.13μm node down to the 5nm node. His technical expertise encompasses a broad range of lithographic areas, including patterning process development, lithography imaging, resolution enhancement techniques (RETs), computational lithography, photomask, optical proximity correction (OPC) and design-technology co-optimization (DTCO). For the past 15 years, Dr. Gao's research has focused on the development of EUV lithography applications and its extensions. He has over 100 publications in various international journals and conferences.